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Germanium diffusion and strain relaxation in Si/Si1−xGex/Si structures

✍ Scribed by G.F.A. Van De Walle; L.J. Van Ijzendoorn; A.A. Van Gorkum; R.A. Van Den Heuvel; A.M.L. Theunissen; D.J. Gravesteijn

No coin nor oath required. For personal study only.

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