Gated wires and interferometers based on Si/SiGe heterostructures
β Scribed by O Estibals; Z.D Kvon; J.C Portal; A.Y Plotnikov; J.L Gauffier; N.J Woods; J Zhang; J.J Harris
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 100 KB
- Volume
- 13
- Category
- Article
- ISSN
- 1386-9477
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β¦ Synopsis
We report the fabrication and study of gated quantum wires and interferometers based on a Si=SiGe heterostructure fabricated by electron lithography and anisotropic ion etching. In the wires, negative magnetoresistance connected with weak localisation e ects and in the ring, Aharonov-Bohm oscillations were investigated in the temperature range 30 mK-5 K. The phase coherence time was found to be due to electron-electron scattering with small energy transfer and magnetic impurity scattering. High magnetic ΓΏeld Aharonov-Bohm oscillations connected with the interference of edge states current have been observed in Si=SiGe ring for the ΓΏrst time.
π SIMILAR VOLUMES
Relaxed SiGe-on-insulator (SGOI) is an attractive material to fabricate strained Si structures. Separation-by-implantation-of-oxygen (SIMOX) is a competing method to synthesize SGOI materials. In this work, pseudomorphic SiGe grown directly on Si substrate without any buffer layer SiGe/Si were impla
Heterostructures of Si 0.80 Ge 0.20 /Si (100) were grown by pulsed laser deposition consisting of alternating 10 nm SiGe and silicon layers for a total of 10 periods. The presence of alloy clustering at SiGe/Si interfaces was investigated by parallel transport in transistor structures. Photoluminesc