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Gamma-irradiation-induced metastable states of undoped amorphous hydrogenated silicon

โœ Scribed by M. S. Ablova; G. S. Kulikov; S. K. Persheev

Book ID
110132018
Publisher
Springer
Year
2002
Tongue
English
Weight
73 KB
Volume
36
Category
Article
ISSN
1063-7826

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Hydrogenated amorphous silicon films 0.45 and 1.12/~m thick, grown by RF glow discharge plasma PECVD on Coming-7059 glass, were irradiated by a 6ยฐCo source (activity 2.8 ร— 1015 Bq) in the dose range 10-450 kGy at different dose rates. The dark current of the samples, under 100 V appfied voltage, was