FTIR, AFM and PL properties of thin SiOx films deposited by HFCVD

✍ Scribed by J.A. Luna-López; G. García-Salgado; T. Díaz-Becerril; J. Carrillo López; D.E. Vázquez-Valerdi; H. Juárez-Santiesteban; E. Rosendo-Andrés; A. Coyopol

• Book ID: 108215781
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 581 KB
• Volume: 174
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2010.05.005