Photolysis of CClFzCHzCl was studied by 147 nm vacuum ultraviolet irradiation. In the presence of NO; CFzCHz, CFZCHC1, and CClFzCN were produced. These products represent three different reaction paths; the molecular dechlorination, molecular dehydrochlorination, and chlorine radical elimination rea
Frequency dependence of CO2 laser photolysis of CClF2CH2Cl and CClF2CHCl2
β Scribed by Matae Iwasaki; Tetsuo Sakka; Atsushi Yokoyama; Kazuya Susuki
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 514 KB
- Volume
- 187
- Category
- Article
- ISSN
- 0009-2614
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β¦ Synopsis
The frequency dependence of the product yields for the photolysis of CCIFICHICl and CCIFICHC12 is investigated by irradiating the molecules with an unfocused beam of a CO2 laser at relatively low fluences. The different product yields are observed when exciting the molecules through the two absorption bands which have almost the same absorbance. The cause of this behavior is discussed.
π SIMILAR VOLUMES
## Abstract Rate coefficients, __k__, and ClO radical product yields, __Y__, for the gasβphase reaction of O(^1^D) with CClF~2~CCl~2~F (CFCβ113) (__k__~2~), CCl~3~CF~3~ (CFCβ113a) (__k__~3~), CClF~2~CClF~2~ (CFCβ114) (__k__~4~), and CCl~2~FCF~3~ (CFCβ114a) (__k__~5~) at 296 K are reported. Rate coe
The rate constants at room temperature have been determined for the reaction of CCI, CClz. and CCIF radicals with various added scavengers. We have employed the technique of laser-induced fluorescence to permit the evaluation of these rate constants.
Excess molar enthalpies, excess molar volumes, and vapour pressures of {x(trans-CHCl:CHCl) + (1-x)(CH2ClCH2Cl or CCl2:CCl2 or CHCl2CHCl2)}, {xCH2ClCH2Cl + (1-x)(CCl2:CCl2 or CHCl2CHCl2)}, and {xCCl2:CCl2 + (1-x)CHCl2CHCl2} were measured at the temperature 298.15 K. Activity coefficients and excess m
We report measuremenl ol Ihe vapour prespures ol CCI2F 2 and CCIFa in Ihe lemperalure ranges 1 72-293 K and 188-273 K, respecHvely. The esl=mated uncerlamhes are 0.2 kPa, max=mum, Ior pressure and 0.001 K Ior lemperalure. In addtl0on, Ihe mosl accurale vapourpressure measuremenls avadable for CClaF,