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Formation of β-FeSi2 thin films by partially ionized vapor deposition

✍ Scribed by Noriyuki Harada; Hiroshi Takai

Book ID: 114167083
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 366 KB
Volume: 206
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(03)00751-1

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