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Formation of TiN by nitridation of magnetron sputtered Ti films using microwave plasma CVD

โœ Scribed by Jong Moon; Toshimichi Ito; Jing Sheng Ma; Akio Hiraki


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
402 KB
Volume
115
Category
Article
ISSN
0022-0248

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