Formation of TiN by nitridation of magnetron sputtered Ti films using microwave plasma CVD

✍ Scribed by Jong Moon; Toshimichi Ito; Jing Sheng Ma; Akio Hiraki

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 402 KB
• Volume: 115
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(91)90809-j