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Formation of silicon carbide layers by the ion beam technique and their electrical properties

✍ Scribed by Tadamasa Kimura; Shigemi Yugo; Song Bao Zhou; Yoshio Adachi


Book ID
113280172
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
414 KB
Volume
39
Category
Article
ISSN
0168-583X

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## Abstract We have studied the ion‐beam synthesis of GaSb nanocrystals in Si by high‐fluence implantation of Sb and Ga ions followed by thermal annealing. RBS, TEM/TED, RS, and photoluminescence (PL) were employed to characterize the implanted layers. It was found that the nanocrystals size increa