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Formation of Si nanocrystals by heavy ion irradiation of amorphous SiO films

✍ Scribed by D. Rodichev; Ph. Lavallard; E. Dooryhée; A. Slaoui; J. Perriere; M. Gandais; Y. Wang

Book ID
113287098
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
590 KB
Volume
107
Category
Article
ISSN
0168-583X

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## Abstract Energy‐filtered transmission electron microscopy proves directly that ion irradiation and post‐irradiation annealing of a Si/SiO~2~ interface results in the formation of a narrow layer of monodisperse Si nanocrystals in the oxide at a tunnel distance from the interface. Position and siz