Formation of Si-based organic thin films with low dielectric constant by using remote plasma enhanced chemical vapor deposition from hexamethyldisiloxane

✍ Scribed by Toshiaki Fujii; Mineo Hiramatsu; Masahito Nawata

• Book ID: 114086741
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 349 KB
• Volume: 343-344
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(98)01693-9