✦ LIBER ✦

Formation of Optical Thin Films by Ion and Plasma Assisted Techniques

✍ Scribed by F. Richter

Publisher: John Wiley and Sons
Year: 2001
Tongue: English
Weight: 826 KB
Volume: 41
Category: Article
ISSN: 0005-8025
DOI: 10.1002/1521-3986(200111)41:6<549::aid-ctpp549>3.0.co;2-e

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✦ Synopsis

An overview of ion and plasma assisted techniques for optical thin films is given. The individual deposition methods are described and their specific advantages and drawbacks with respect to optical thin film deposition presented. It is shown that ion and plasma assistance can have also unwelcome side effects. As far as possible the physical mechanisms governing the film formation are identified and used for interpretation of the experimental results.

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