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Formation of large-area nanostructures on Si and Ge surfaces during low energy ion beam erosion

✍ Scribed by Ziberi, B.; Frost, F.; Rauschenbach, B.


Book ID
127273539
Publisher
AVS (American Vacuum Society)
Year
2006
Tongue
English
Weight
702 KB
Volume
24
Category
Article
ISSN
0734-2101

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Ion implantation of 20 keV 12 C + ions into (1 0 0), p-type silicon with ion fluence of 8 β€’ 10 16 at. cm Γ€2 followed by an electron beam annealing under high vacuum conditions has been performed to investigate the formation of crystalline nano-scale SiC features on the silicon surface. Depending on