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Formation of highly moisture-resistive SiNx films on Si substrate by Cat-CVD at room temperature

✍ Scribed by Toshiharu Minamikawa; Akira Heya; Toshikazu Niki; Masahiro Takano; Yasuto Yonezawa; Susumu Muroi; Shigehira Minami; Atsushi Masuda; Hironobu Umemoto; Hideki Matsumura

Book ID: 108288957
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 863 KB
Volume: 501
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2005.07.173

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