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Formation of Epitaxial NiSi2 by High Dose Implantation and Rapid Thermal Annealing

✍ Scribed by Petukhov, V. Yu. ;Khaibullin, I. B. ;Zaripov, M. M. ;Wieser, E. ;Grötzschel, R. ;Bartsch, H.

No coin nor oath required. For personal study only.

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