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Formation of crystalline SiC films by CH4 plasma immersion ion implantation into Si

✍ Scribed by K Volz; B Rauschenbach; B Stritzker; W Ensinger

Book ID: 114170705
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 507 KB
Volume: 148
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(98)00757-5

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