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Formation of Al-Fe-V-Si amorphous thin films by Ar+implantation

โœ Scribed by Y. -F. Zhao; J. -Q. Wang; M. -K. Tseng

Publisher
Springer
Year
1995
Tongue
English
Weight
712 KB
Volume
14
Category
Article
ISSN
0261-8028

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The formation mechanism of a high density of nanovoids by annealing amorphous Al 2 O 3 thin films prepared by an electron beam deposition method was investigated. Transmission electron microscopy observations revealed that nanovoids $1-2 nm in size were formed by annealing amorphous Al 2 O 3 thin fi