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Formation of a-C thin films by plasma-based ion implantation

✍ Scribed by Watanabe, Toshiya; Yamamoto, Kazuhiro; Koga, Yoshinori; Tanaka, Akihiro

Book ID
120971739
Publisher
Institute of Physics and National Institute of Materials Science
Year
2001
Tongue
English
Weight
419 KB
Volume
2
Category
Article
ISSN
1468-6996

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## Abstract Titanium dioxide thin films were deposited near room temperature by plasma based ion implantation and deposition with the voltage pulses, accelerating the ions towards the substrate, ranging from 0 kV to 10 kV. Correspondingly, an increase of average energy per deposited particle from 2