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Formation and mechanism of silicon nanostructures by Ni-assisted etching

✍ Scribed by Yue, Zhihao; Shen, Honglie; Jiang, Ye; Jin, Jiale; Wang, Wei

Book ID
121549920
Publisher
Springer US
Year
2014
Tongue
English
Weight
776 KB
Volume
25
Category
Article
ISSN
0957-4522

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## Abstract The morphology of metal‐assisted electroless etched n‐type silicon in HF–oxidizing agent–H~2~O etching system as a function of oxidizing type and etching time was studied. Three types of oxidizing agent were investigated: Na~2~S~2~O~8~, K~2~Cr~2~O~7~ and KMnO~4~. The layers formed on si