Fluence loss due to Rutherford backscattering for very low energy ion implantation in silicon

✍ Scribed by Zhiyong Zhao; Che-Hoo Ng; Ted Neil; Jinning Liu; Jianyue Jin

• Book ID: 113822991
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 262 KB
• Volume: 219-220
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2004.01.167