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Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe:H

โœ Scribed by James R. Doyle; Yueqin Xu; Robert Reedy; Howard M. Branz; A. Harv Mahan


Book ID
108289830
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
159 KB
Volume
516
Category
Article
ISSN
0040-6090

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