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Film properties of nitrogen-doped polycrystalline silicon for advanced gate material

✍ Scribed by Sang Ho Woo; Yil Wook Kim; Pyung Yong Um; Hae-Min Lee; Chang-Koo Kim

Book ID
107514204
Publisher
Springer US
Year
2009
Tongue
English
Weight
809 KB
Volume
26
Category
Article
ISSN
0256-1115

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