Structural property of polycrystalline silicon films on aluminum-doped zinc oxide-coated glass

✍ Scribed by Weiyan Wang; Jinhua Huang; Xianpeng Zhang; Ye Yang; Ruiqin Tan; Weijie Song

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 616 KB
• Volume: 328
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/j.jcrysgro.2011.06.028

✦ Synopsis

The structural properties of crystalline silicon (Si) films on bare and aluminum-doped zinc oxide (AZO)-coated glass substrates were comparatively investigated by X-ray diffractometer, Raman spectroscopy, and transmission electron microscope. It was observed that for the amorphous Si (a-Si) films on bare and AZO-coated glass substrates subjected to five-step rapid thermal annealing (RTA) at 750 1C/60 s, they were both polycrystalline in nature and, moreover, the Si characteristic peak intensity of Si films on AZO-coated glass was slightly higher than that of Si films on bare glass, while the crystalline volume fractions of Si films on both substrates were nearly similar. Furthermore, it was revealed that a-Si films on AZO-coated glass can be crystallized when subjected to five-step RTA 750 1C/60 s, while Zn 2 SiO 4 new phase was formed at RTA temperature of 900 1C or higher, which may influence the crystalline Si films property.