✦ LIBER ✦

Fabrication of thin film diodes using reactive sputtering

✍ Scribed by P. Magill

Book ID: 126680413
Publisher: IEEE
Year: 1963
Tongue: English
Weight: 146 KB
Volume: 51
Category: Article
ISSN: 0018-9219
DOI: 10.1109/PROC.1963.2401

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Fabrication of BSCCO thin films using sp

Fabrication of BSCCO thin films using sputtering technique

✍ Hadi Salamati; Parviz Kameli; Mohammad Akhavan 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 230 KB

Fabrication and properties of ZnO thin f

Fabrication and properties of ZnO thin films by DC diode sputtering technique using Zn target

✍ Kazuo Kuma; Toyasaka Moriizumi; Tsutomu Yasudo 📂 Article 📅 1976 🏛 John Wiley and Sons 🌐 English ⚖ 573 KB

Indium oxide thin film transistors via r

Indium oxide thin film transistors via reactive sputtering using metal targets

✍ Qijun, Yao ;Dejie, Li 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 214 KB

## Abstract Thin film transistors with In~2~O~3~ channel were fabricated. The channel layer of In~2~O~3~ and gate dielectric of Ta~2~O~5~ in the device was deposited by reactive sputtering using metal targets. A thin layer of Bi was deposited on the channel and then an‐ nealed to help stabilize the

Thin-film capacitors using tantalum oxid

Thin-film capacitors using tantalum oxide dielectrics prepared by reactive sputtering

✍ P. Lloyd 📂 Article 📅 1961 🏛 Elsevier Science 🌐 English ⚖ 117 KB

MgB2 thin film fabrication by rf magnetr

MgB2 thin film fabrication by rf magnetron sputtering

✍ Zon Mori; Koji Eitoku; Toshiya Doi; Shin-ichiro Koba; Yoshinori Hakuraku 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 85 KB

thin films by reactive magnetron sputter

thin films by reactive magnetron sputtering

✍ Hellgren, Niklas; Johansson, Mats P.; Broitman, Esteban; Hultman, Lars; Sundgren 📂 Article 📅 1999 🏛 The American Physical Society 🌐 English ⚖ 479 KB