𝔖 Bobbio Scriptorium

✦ LIBER ✦

Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

✍ Scribed by M. Karlsson; I. Vartianen; M. Kuittinen; F. Nikolajeff

Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 738 KB
Volume: 87
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.12.085

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Fabrication of high aspect ratio sub-mic

Fabrication of high aspect ratio sub-micron structures by variable-shape electron lithography

✍ T.S. Norris; G.A.C. Jones; H. Ahmed 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 812 KB

Trilevel reactive ion etching processes

Trilevel reactive ion etching processes for fabrication of 60 nm germanium structures with high aspect ratio: Matthies, T.; David, C.; Thieme, J. Journal of Vacuum Science & Technology B (Microelectronics Processing and Phenomena). 1993 Sep

📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 112 KB