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Fabrication of Strain-Relaxed Si1 −xGex/Si(001) Buffer Layers of Low Surface Roughness

✍ Scribed by N. V. Vostokov; Yu. N. Drozdov; Z. F. Krasil’nik; O. A. Kuznetsov; A. V. Novikov; V. A. Perevoshchikov; M. V. Shaleev

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Special features of the formation of Ge(

✍ N. V. Vostokov; Yu. N. Drozdov; Z. F. Krasil’nik; O. A. Kuznetsov; D. N. Lobanov 📂 Article 📅 2006 🏛 Springer 🌐 English ⚖ 243 KB

Photoreflectance study of strained (001)

✍ Yichun Yin; Fred H. Pollak; P. Auvray; D. Dutartre; R. Pantel; J.A. Chroboczek 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 320 KB

Elastic strain energy of graded Si1−xGex

✍ G. Heigl; G. Span; E. Kasper 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 350 KB

Thermally stimulated relaxation of misfi

✍ T. G. Yugova; M. G. Mil’vidskii; M. M. Rzaev; F. Schäffler 📂 Article 📅 2005 🏛 SP MAIK Nauka/Interperiodica 🌐 English ⚖ 81 KB

Magnetotransport studies of remote doped

✍ D. Többen; F. Schäffler; A. Zrenner; G. Abstreiter 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 407 KB

Fabrication of relaxed GeSi buffer layer

✍ Y.H. Xie; E.A. Fitzgerald; P.J. Silverman; A.R. Kortan; B.E. Weir 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 695 KB