Fabrication of relaxed GeSi buffer layers on Si(100) with low threading dislocation density

✍ Scribed by Y.H. Xie; E.A. Fitzgerald; P.J. Silverman; A.R. Kortan; B.E. Weir

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 695 KB
• Volume: 14
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/0921-5107(92)90316-2