Fabrication of large-grain polycrystalline Ge films using absorptive films
β Scribed by C.-C. Kuo
- Publisher
- Springer
- Year
- 2008
- Tongue
- English
- Weight
- 652 KB
- Volume
- 91
- Category
- Article
- ISSN
- 0721-7269
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UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen
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