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Fabrication of grating patterns by e-beam lithography

โœ Scribed by H. Ohki; T. Asari; H. Takemura; M. Isobe; K. Moriya


Book ID
103598022
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
423 KB
Volume
9
Category
Article
ISSN
0167-9317

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Fabrication of sub-quarter-micron gratin
โœ L.A. Wang; C.H. Lin; J.H. Chen ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 790 KB

Sub-quarter-micron grating patterns with period as fine as 0.22 p.m have been obtained by combining DUV holographic lithography and silylation technique for the first time. A traditional chemical amplified resist (JSR KRF/K2G) originally working for single layer process at 248 nm wavelength was used