✦ LIBER ✦
Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography
✍ Scribed by L.A. Wang; C.H. Lin; J.H. Chen
- Book ID
- 104306555
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 790 KB
- Volume
- 46
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
Sub-quarter-micron grating patterns with period as fine as 0.22 p.m have been obtained by combining DUV holographic lithography and silylation technique for the first time. A traditional chemical amplified resist (JSR KRF/K2G) originally working for single layer process at 248 nm wavelength was used for silylation. The silylation selectivity was improved by process control and a photoresist pattern with an aspect ration of 4 was obtained.