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Fabrication of field emitter array using focused ion and electron beam induced reaction

โœ Scribed by M. Takai; T. Kishimoto; H. Morimoto; Y.K. Park; S. Lipp; C. Lehrer; L. Frey; H. Ryssel; A. Hosono; S. Kawabuchi


Book ID
114155830
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
361 KB
Volume
41-42
Category
Article
ISSN
0167-9317

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Electron-beam(EB)-induced deposition using precursor molecule of WF6 is applied to making metal/insulator/metal tunnel junctions for single electron transport devices. The SiO2 substrate pre-treated by oxygen plasma is contaminated with hydro-carbon material and the deposits show rapid decrease in