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Fabrication and thermal annealing behavior of nanoscale ripple fabricated by focused ion beam

✍ Scribed by D.Z. Xie; B.K.A. Ngoi; W. Zhou; Y.Q. Fu

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
278 KB
Volume
227
Category
Article
ISSN
0169-4332

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Highly (0 0 2)-oriented AlN film was deposited on n-type (1 0 0)-oriented silicon substrates by the radio frequency magnetron sputtering method. An individual AlN cone with high aspect ratio was fabricated by the focused ion-beam (FIB) etching process in the surface of an as-formed AlN film. This et