Fabrication of phase masks, for fiber gr
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M. Ardito; L. Boschis; R. Palumbo; G. Meneghini
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Article
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1999
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Elsevier Science
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English
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This paper reports on the fabrication process of phase mask for fiber grating printing. The masks are produced by Electron Beam Lithography (EBL) and Reactive Ion Etching (RIE). A special writing strategy is used in order to reduce the stitching errors. RIE with CI-IF3 will be discussed. Finally mor