Fabrication of phase masks, for fiber grating printing, using EBL and CHF3 RIE

✍ Scribed by M. Ardito; L. Boschis; R. Palumbo; G. Meneghini

• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 926 KB
• Volume: 46
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(99)00074-x

✦ Synopsis

This paper reports on the fabrication process of phase mask for fiber grating printing. The masks are produced by Electron Beam Lithography (EBL) and Reactive Ion Etching (RIE). A special writing strategy is used in order to reduce the stitching errors. RIE with CI-IF3 will be discussed. Finally morphological and optical characterization of the phase mask and of the photo induced fiber grating will be discussed.