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Fabrication and characterization of InP nanocrystals embedded in SiO2 matrix by RF magnetron co-sputtering

✍ Scribed by Ruiqin Ding; Hao Wang; Huidong Yang; Weilong She; Zhiren Qiu; Li Luo; W.F. Lau; W.Y. Cheung; S.P. Wong

Book ID
114192936
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
110 KB
Volume
76
Category
Article
ISSN
0254-0584

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Si nanocrystals (NCs) embedded in an SiC matrix were prepared by the deposition of Si-rich Si 1-x C x /SiC nanomultilayer films using magnetron sputtering, subsequently followed by thermal annealing in the range of 800 ∼ 1200 °C. As the annealing temperature increases to 1000 °C, Si NCs begin to for