Extraordinarily high drive currents in asymmetrical double-gate MOSFETs
β Scribed by Jerry G. Fossum; Zhibin Ren; Keunwoo Kim; Mark Lundstrom
- Book ID
- 102620299
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 271 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0749-6036
No coin nor oath required. For personal study only.
β¦ Synopsis
Numerical simulation results derived from a SchrΓΆdinger-Poisson tool applied to scaled double-gate (DG) MOSFETs, supplemented by analytical characterizations of the pertinent physics, are presented to give insight concerning the near-ideal features of DG devices and to explain how the low-voltage drive current of the asymmetrical DG MOSFET, having only one predominant channel, can be comparable to, and even higher than, that of the symmetrical-gate counterpart designed to have the same off-state current.
π SIMILAR VOLUMES
Self-aligned inversion-channel In 0.75 Ga 0.25 As metal-oxide-semiconductor field-effect transistors (MOSFETs) using molecular beam epitaxy (MBE) deposited Al 2 O 3 /Ga 2 O 3 (Gd 2 O 3 ) [GGO] as gate dielectrics and TiN as metal gates were fabricated. The 1-mm-gate-length In 0.75 Ga 0.25 As MOSFETs