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Excimer‐laser annealing for low‐temperature poly‐Si TFTs

✍ Scribed by Kim, Hyun Jae


Book ID
126943805
Publisher
Informa UK (Taylor & Francis)
Year
2003
Tongue
English
Weight
311 KB
Volume
4
Category
Article
ISSN
1598-0316

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Low temperature poly-Si TFTs for display
✍ In-Hyuk Song; Min-Koo Han 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 240 KB

We have fabricated new polycrystalline silicon (poly-Si) thin film transistors (TFTs) with a single grain-boundary by a simple excimer laser annealing (ELA) method which employs a selectively floating amorphous silicon (a-Si) active layer and Al patterns. A thermally insulating air-gap between the f