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Ex situ A.C. impedance studies of oxide film growth on Zircaloys in high temperature/high pressure steam

✍ Scribed by L. Durand-Keklikian; G. Cragnolino; D.D. Macdonald


Book ID
115847213
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
725 KB
Volume
32
Category
Article
ISSN
0010-938X

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