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In situ A.C. impedance studies of oxide film growth on Zircaloy-4 in high temperature/high pressure steam

✍ Scribed by L. Durand-Keklikian; G. Cragnolino; D.D. MacDonald

Book ID: 115847214
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 232 KB
Volume: 32
Category: Article
ISSN: 0010-938X
DOI: 10.1016/0010-938x(91)90080-9

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