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Evaluation of phase, composition, microstructure and properties in TiC/a-C:H thin films deposited by magnetron sputtering

✍ Scribed by W. Gulbiński; S. Mathur; H. Shen; T. Suszko; A. Gilewicz; B. Warcholiński

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
373 KB
Volume
239
Category
Article
ISSN
0169-4332

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Titanium containing amorphous carbon (TiC/a-C:H) films were deposited by a hybrid IPVD/PECVD (Ionized Physical Vapor Deposition/Plasma Enhanced Chemical Vapor Deposition) process combining titanium target magnetron sputtering and PECVD in an Ar-CH 4 plasma. Films with various carbon contents have be