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Evaluation of pattern registration accuracy in X-ray lithography

โœ Scribed by Masahiro Okabe; Yasuo Furukawa; Takefumi Inagaki

Book ID
112075036
Publisher
John Wiley and Sons
Year
1981
Tongue
English
Weight
368 KB
Volume
64
Category
Article
ISSN
8756-6621

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Deep X-ray lithography with synchrotron radiation (DXRL) constitutes the key microfabrication process step in the LIGA technology. Microcomponents with a height of some gm up to several mm can be manufactured with sub-gm precision. The pattern transfer accuracy is governed by technological constrain