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Evaluation of Al(Nd)-alloy films for application to thin-film-transistor liquid crystal displays

✍ Scribed by H. Takatsuji; E. G. Colgan; C. Cabral; J. M. E. Harper


Book ID
126603792
Publisher
IBM
Year
1998
Tongue
English
Weight
656 KB
Volume
42
Category
Article
ISSN
0018-8646

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## Abstract This paper describes the optimization of ZnO:Al (AZO) thin films formed by a magnetron sputtering method for the purpose of creating a substitute for the indium‐tin‐oxide (ITO) transparent electrodes used in liquid crystal display (LCD) applications. New AZO thin‐film preparation techni