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Etching mechanisms during plasma jet machining of silicon carbide

✍ Scribed by Inga-Maria Eichentopf; Georg Böhm; Thomas Arnold

Book ID: 113919418
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 569 KB
Volume: 205
Category: Article
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2011.03.003

No coin nor oath required. For personal study only.

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