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Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

✍ Scribed by Ouk Kim, Sang; Solak, Harun H.; Stoykovich, Mark P.; Ferrier, Nicola J.; de Pablo, Juan J.; Nealey, Paul F.

Book ID
109891208
Publisher
Nature Publishing Group
Year
2003
Tongue
English
Weight
461 KB
Volume
424
Category
Article
ISSN
0028-0836

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**Topographical confinement** is used to template the formation of nanoscale domains in a self‐assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example,