Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography
β Scribed by J.Y. Cheng; C.A. Ross; E.L. Thomas; H.I. Smith; G.J. Vancso
- Publisher
- John Wiley and Sons
- Year
- 2003
- Tongue
- English
- Weight
- 204 KB
- Volume
- 15
- Category
- Article
- ISSN
- 0935-9648
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β¦ Synopsis
Topographical confinement is used to template the formation of nanoscale domains in a selfβassembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)
π SIMILAR VOLUMES
**Organized structures over length scales differing by 10^3^** are reported, i.e., crystals of rod block (unit cell βΌβ1 nm), block copolymer microdomains (layer periodicity βΌβ50 nm), and NΓ©el domain walls (wall periodicity βΌβ1000 nm)βsee Figure and inside front cover. The result is an example of com