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Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography

✍ Scribed by J.Y. Cheng; C.A. Ross; E.L. Thomas; H.I. Smith; G.J. Vancso


Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
204 KB
Volume
15
Category
Article
ISSN
0935-9648

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✦ Synopsis


Topographical confinement is used to template the formation of nanoscale domains in a self‐assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)


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**Organized structures over length scales differing by 10^3^** are reported, i.e., crystals of rod block (unit cell βˆΌβ€‰1 nm), block copolymer microdomains (layer periodicity βˆΌβ€‰50 nm), and NΓ©el domain walls (wall periodicity βˆΌβ€‰1000 nm)β€”see Figure and inside front cover. The result is an example of com