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Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

โœ Scribed by Joy Y. Cheng; Charles T. Rettner; Daniel P. Sanders; Ho-Cheol Kim; William D. Hinsberg


Book ID
102688922
Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
813 KB
Volume
20
Category
Article
ISSN
0935-9648

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