Epitaxial growth of Si1−xGex alloys and Ge on Si(100) by electron-cyclotron-resonance Ar plasma chemical vapor deposition without substrate heating

✍ Scribed by Ueno, Naofumi; Sakuraba, Masao; Murota, Junichi; Sato, Shigeo

• Book ID: 122270788
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 871 KB
• Volume: 557
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2013.11.023