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Epitaxial growth of A1N film by low-pressure MOCVD in gas-beam-flow reactor

✍ Scribed by S. Kaneko; M. Tanaka; K. Masu; K. Tsubouchi; N. Mikoshiba

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 489 KB
Volume: 115
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(91)90819-q

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