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Environments of ion-implanted dopants in amorphous silicon at various stages of annealing

✍ Scribed by G.N. Greaves; A.J. Dent; B.R. Dobson; S. Kalbitzer; G. Müller

No coin nor oath required. For personal study only.

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✍ Goltzene, A. ;Meyer, B. ;Schwab, C. ;Liu, X. H. ;Bohringer, K. ;Kalbitzer, S. 📂 Article 📅 1985 🏛 John Wiley and Sons 🌐 English ⚖ 169 KB