๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Enhancement of the deposition rate of a-Si:H by introduction of an electronegative molecule into a silane discharge

โœ Scribed by Toru Ikeda; Ian S. Osborne; Nobuhiro Hata; Akihisa Matsuda


Book ID
115991045
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
230 KB
Volume
198-200
Category
Article
ISSN
0022-3093

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES