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Embedded HIMOS(R) flash memory in 0.35 μm and 0.25 μm CMOS technologies

✍ Scribed by Wellekens, D.; Van Houdt, J.; Haspeslagh, L.; Tsouhlarakis, J.; Hendrickx, P.; Deferm, L.; Maes, H.E.

Book ID
114538326
Publisher
IEEE
Year
2000
Tongue
English
Weight
156 KB
Volume
47
Category
Article
ISSN
0018-9383

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✍ A. Fox; K.E. Ehwald; P. Schley; R. Barth; S. Marschmeyer; C. Wolf; V.E. Stikanov 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 397 KB

This paper presents a process technology for cost-effective integration of low-power flash memories into a 0.25 mm, high performance SiGe:C RF-BiCMOS process. Only four additional lithographic steps are used on top of the baseline BiCMOS process, leading to in total 23 mask levels for the BiCMOS/emb